Nonthermal Plasmas for Materials Processing, , Wiley, Jörg Florian Friedrich, Jürgen Meichsner,Nuclear physics,Physics,

Cold plasma; Non-thermal plasma; Low-pressure plasma; Atmospheric-pressure plasma; Glow discharge; RF plasma; MW plasma; Barrier discharge; Plasma jet; Electron temperature; Electron energy; Electron density; Excited states; Energy-rich neutrals; Vacuum-UV-radiation; UV radiation; Debye sheath; Gas phase; Adsorption layer; Surface modification; Polymer surface modification; Functionalization; Plasma etching; Surface modification; Functional groups; Plasma polymerization; PECVD (Plasma Enhanced Chemical Vapor Deposition); Radicals; Peroxy groups; Hydroperoxide; Auto-oxidation; Bromination in plasma. LMWOM (Low-Molecular Weight Oxidized Material); WBL (Weak Boundary Layer); Powder formation; Graphene oxidation; Carbon fiber; Plasma metallization; Selective etching; Photocatalytic thin films; Cell-adhesive and anti-adhesive implant coatings

,, , United States, en-UShttps://www.wiley.com

Cold plasma; Non-thermal plasma; Low-pressure plasma; Atmospheric-pressure plasma; Glow discharge; RF plasma; MW plasma; Barrier discharge; Plasma jet; Electron temperature; Electron energy; Electron density; Excited states; Energy-rich neutrals; Vacuum-UV-radiation; UV radiation; Debye sheath; Gas phase; Adsorption layer; Surface modification; Polymer surface modification; Functionalization; Plasma etching; Surface modification; Functional groups; Plasma polymerization; PECVD (Plasma Enhanced Chemical Vapor Deposition); Radicals; Peroxy groups; Hydroperoxide; Auto-oxidation; Bromination in plasma. LMWOM (Low-Molecular Weight Oxidized Material); WBL (Weak Boundary Layer); Powder formation; Graphene oxidation; Carbon fiber; Plasma metallization; Selective etching; Photocatalytic thin films; Cell-adhesive and anti-adhesive implant coatings

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